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Nano Porous GaN Diode Laser

Nano Porous GaN Diode Laser

The key factors preventing the widespread use of LD lasers in lighting are:

  • Insufficient Power Conversion Efficiency (PCE)
  • Aluminum degrades performance and lifetime.

What Nano Porous (NP) GaN offers:

  • NP GaN offers 2X higher electrical efficiency (PCE) than commercial State Of The Art LDs.
  • Brings LD PCE in line with commercial LEDs.
  • NP GaN is Aluminum-free.
  • Lowers the minimum current density for emission.
  • Allows higher blue/green laser power output (Boosts Optical Field X3).

About NP GaN:

  • A novel electrochemical etching process alters the optical index of GaN by making it nanoporous.
  • This is a commercially viable process that can be implemented in any LD or LED chip facility.

Yale Patent Status:

  • PCT/US2016/033270 ’III-Nitride Edge Emitting Laser Diode of High Confinement Factor’